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PECVD Split Tube Furnace

1200ºC Max. PECVD Split Tube Furnace / 4 Channels Gas Delivery & Vacuum Pump OTF-1200X-PEC4LV is a CE certified compact PE-CVD ( Plasma Enhanced Chemical Vapor Deposition ) tube furnace system, which consists of 300W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4...

The system includes a 500W RF plasma generator, 80Dx1600L mm two zone sliding tube furnace, 4 channel mass flow gas supply system and mechanical pump unit. This PECVD system can be used to grow nanometer or graphene. Four precision mass flowmeters (accuracy:0.02%): digital display, automatic control. 


Model

Tube size

Heating zone length(mm)

Constant temp zone length(mm)

Mixture System

Vacuum degreePa

Max    temp(℃)

Continuous temp(℃)

Power(KW)

Voltage(V)

HTF1200-8/40-II-L-V-4M-PE

φ80*1800

200+200

100+100

4M

1

1200

1100

3

220

 


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