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PECVD Furnace System

400°C Compact PECVD Furnace System with 3" Quartz Chamber This is a miniature PECVD furnace with 3" diameter x 16" Length quartz chamber, internal heating coil, two-channel gas mixing & delivery system, and a vacuum pump. The complete system is placed on a mobile cart for easy...

This is a small PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system. The equipment  consists of a 500W RF plasma generator, a open-type tube furnace that the  diameter is 50mm(with a vacuum flange and connecting pipe), and a direct connection double rotary mechanical pump. So this set of device models can be updated to different PECVD systems. This system is ideal for the material exploration under a limited budget.

1)Lower  temperature processing compared to conventional CVD. 

2)Film  stress can be controlled by high/low frequency mixing techniques. 

3)Control  over stoichiometry via process conditions.

4)Can do  a wide range of material deposition, including SiOx, SiNx, SiOxNy  and Amorphous silicon (a-Si:H) deposition.


Model

Tube size

Heating zone length(mm)

Constant temp zone length(mm)

Mixture System

Vacuum degreePa

Max    temp(℃)

Continuous temp(℃)

Power(KW)

Voltage(V)

HTF1200-5/20-V-3F-PE

φ50*780mm

200

80

3F

1

1200

1100

1.2

220



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