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SiC vapor deposition furnace
Jan 18, 2018


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Technical parameters:   

The chemical vapor deposition furnace can be used as a surface oxidation coating and matrix modification with silane as the gas source.



Product



Technical parameters:   

The chemical vapor deposition furnace can be used as a surface oxidation coating and matrix modification with silane as the gas source.

The chemical vapor deposition furnace can design size according to customer's demand, and can meet the requirement of super large workpiece chemical vapor deposition treatment.

The chemical vapor deposition furnace adopts advanced control technology, which can accurately control the flow and pressure of MTS. The gas flow in the furnace is stable and the range of pressure fluctuation is small.

The chemical vapor deposition furnace adopts special structure deposition chamber, which has good sealing effect and strong anti pollution ability.

The chemical vapor deposition furnace adopts multi channel sedimentary gas path, with uniform flow field, no deposition dead angle and good deposition effect.

The high corrosion gas, flammable and explosive gas, solid dust and low melting point sticky products produced by the deposition can be effectively treated. 

 

Specification:

Model

VHS-40/40/80-1500CVD

VHS-80/80/120-1500CVD

VHS-100/100/150-1500CVD

VHS-120/120/250-1500CVD

Workspace

W×H×L(mm)

400×400×800

800×800×1200

1000×1000×1500

1200×1200×2500

Max temp(℃)

1500

1500

1500

1500

Temp uniformity(℃)

±7.5

±7.5

±7.5

±10

Ultimate vacuum degree(Pa)

50

50

50

50

Pressure rise rate(Pa/h)

3

3

3

3


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